Title:
フォトレジスト成分濃度測定装置および濃度測定方法
Document Type and Number:
Japanese Patent JP6643710
Kind Code:
B2
Abstract:
A photoresist stripping solution used for recycling denatures over time as dissolved photoresist increases, and thus concentration measurement by absorbance suffered from the problem of a calibration curve shifting. This photoresist component concentration measurement device is characterized by being provided with a measuring means that specifies an element that is contained in a photoresist but is not contained in the photoresist stripping solution, and measures the concentration of the specified specific element in the photoresist stripping solution.
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Inventors:
Kazuya Shimada
Nishikawa Haruka
Kito Yusuke
Nishikawa Haruka
Kito Yusuke
Application Number:
JP2016012558A
Publication Date:
February 12, 2020
Filing Date:
January 26, 2016
Export Citation:
Assignee:
Panasonic IP Management Co., Ltd.
International Classes:
H01L21/027; G01N23/2204; G01N23/223; G03F7/42
Domestic Patent References:
| JP2005191030A | ||||
| JP2005535780A | ||||
| JP2015162659A | ||||
| JP200058411A |
Attorney, Agent or Firm:
Masaki Hiroyuki