Title:
気体処理装置および基板処理装置
Document Type and Number:
Japanese Patent JP6890617
Kind Code:
B2
Abstract:
A gas processing device according to this embodiment comprises a housing, a lyophilic nonwoven fabric, a liquid supply unit, a gas introduction unit, and a gas discharge unit. The housing has an internal space. The lyophilic nonwoven fabric is disposed in the internal space. The liquid supply unit supplies cleaning liquid to the nonwoven fabric. The gas introduction unit introduces gas to the internal space. The gas discharge unit discharges gas from the internal space. In addition, the gas processing device according to this embodiment brings gas introduced from the gas introduction unit into contact with a liquid film of the cleaning liquid formed on the surface of the nonwoven fabric.
Inventors:
Takayuki Toshima
Kazuo Terada
Yuko Ono
Kazuo Sakamoto
Kazuo Terada
Yuko Ono
Kazuo Sakamoto
Application Number:
JP2018568139A
Publication Date:
June 18, 2021
Filing Date:
February 07, 2018
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
B01D53/18; B01D53/46; B01D53/58; B01D53/68; B01D53/72; B01D53/78; H01L21/304
Domestic Patent References:
| JP49034070A | ||||
| JP48073371A | ||||
| JP2016140837A | ||||
| JP2000315673A | ||||
| JP2001299884A |
Attorney, Agent or Firm:
Sakai International Patent Office