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JP3742503B2 |
To provide a lance sealing device in a vacuum degassing equipment, in which the wear of a gland packing is prevented and the sealability is improved and the manufacture and the fitting of the lance and a guide rail therefor can be simpli...
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JP2006029611A |
To provide a tabular structure suitable as a setter for baking providing compatibility between degreasing and surface smoothness of a burned product, and its manufacturing method.Since a ventilation passage 32 communicated with an outer ...
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JP2005507494T5 |
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JP2005537455A |
A parts container for minimizing oxidation of heat-treated parts during transfer in an oxygen-containing environment. The container includes: a heat-resistant vessel having an interior space and including oppositely positioned first and ...
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JP3715073B2 |
To provide a heat-treating device which can effectively prevent the positional deviation of a substrate, when the substrate is elevated and lowered while the substrate is supported by supporting pins. A heat-treating device is provided w...
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JP2005308264A |
To provide a ceramic molding firing method for improving a yield and reducing manufacturing cost.The firing method for a ceramic molding 1 having a through-hole comprises a step of preparing a rod R having a hollow portion and a sheath 1...
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JP3706197B2 |
To provide a method for in-situ sealing for burning out binder in an open atmosphere and sintering in a closed atmosphere. For sintering a product such as a ceramic substrate, a single furnace loading cycle technique, and a ventable sint...
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JP2005265202A |
To provide a heating device capable of improving degree of freedom in design of the device.A heating chamber 126 for heating a circuit base 101 is formed in a reflow furnace 100. This heating device is provided with a pair of conveyance ...
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JP2005265360A |
To provide a compact and inexpensive heat treatment device and a heat treatment method for a sheet-shaped material such as a continuous carbon fiber material, having high heat efficiency and capable of improving the productivity and smoo...
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JP3667477B2 |
To obtain parts and a jig stably usable for a gas carburizing furnace in an environment is which thermal impact is severe for a long time by subjecting parts and a jig made of metals to calorizing treatment and forming an Al cementation ...
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JP2005519019A |
A method and plant for manufacturing cement clinker are disclosed, in which cement raw meal is calcined in a calciner. The calciner comprises an upper zone and a lower zone, where fuel, combustion gas and raw meal are introduced into the...
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JP3109840U |
A substrate support ring has a band having an inner perimeter that at least partially surrounds a periphery of the substrate. The band has a radiation absorption surface. A lip extends radially inwardly from the inner perimeter of the ba...
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JP2005083705A |
To provide a multistage heat treatment device capable of precisely heat-treating a heating object in a multistage shape at the prescribed temperature.This multistage heat treatment device 10 has a cartridge 2 for storing the heating obje...
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JP3631211B2 |
To provide a high-temperature microwave oven easily made large-scale with microwave as heat source and a support and a shelf board member for use in it. With the high-temperature microwave oven using microwave as a heating source, an obj...
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JP2005507494A |
A process for vitrifying contaminated waste material (30) includes providing a container (10) including an insulating lining (16), placing the waste material (30) in the lined container (10), subjecting the material (30) to an electric c...
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JP2005069668A |
To provide a baking container for silicon nitride-based ceramic in which a silicon nitride-based molded article, especially, a honeycomb molded article containing metal silicon particles and/or silicon nitride particles can be subjected ...
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JP3622932B2 |
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JP2005041777A |
To provide an electronic component firing tool whose durability for a long term is improved by solving the problems that the durability for a long term lacks such that a surface layer is peeled from an intermediate layer and the like as ...
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JP3610369B2 |
Method of bonding or linkage between a first place (1) or a given material and another place (2) of another material, characterized in that thermodeformable bimetal elements (4) are interposed between the first piece (1) and the second p...
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JP3602604B2 |
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JP2004535512A |
A support slug ( 2 ) used for the heat treatment of a part ( 3 ), particularly for the hardening of a steel part, comprises a guide element ( 221 ) that is used to guide the part ( 3 ) towards a supporting surface ( 230 ) of the support ...
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JP2004534929A |
The present invention relates to thermal reactions performed at rapid transient temperatures, and a furnace (1) able to perform such reactions. The method and the furnace may suitably be applied to perform reactions between reactants whe...
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JP2004306140A |
To provide a solder reflow oven capable of extending the distance that a workpiece is heated to solder reflow temperatures without interference of the workpiece with the oven in an upstream side and a downstream side.The solder reflow ov...
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JP2004532179A |
The support plate for transporting products during thermal treatment at firing temperatures is a nonporous keatite glass ceramic supporting member without a glassy surface layer. It has a nubby structure on an underside thereof and prefe...
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JP2004262751A |
To provide a method of manufacturing a setter for firing a ceramic core used for the casting of molten metal to scarcely deform.A green ceramic setter is formed by molding a mixture containing ceramic particles and a binder, Next, the gr...
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JP2004263888A |
To provide an inexpensive setter having superior durability.This setter is used when baking an electronic part. A leg 2 projecting to the upper surface side and the under surface side of a flat plate 1 composed of a flat refractory is ar...
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JP2004253665A |
To provide a wafer holder for a semiconductor manufacturing apparatus wherein the thermal uniformity of the wafer holding surface of a wafer holder having a wafer mounting surface is improved, and to provide a semiconductor manufacturing...
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JP3545475B2 |
PURPOSE: To provide a shutter device which has better sealability and simply meets a material to be treated. CONSTITUTION: A shutter strip 1 has a projection line 11 on one end side thereof, a groove part 12 on the other end side thereof...
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JP2004197959A |
To provide a shelf board for a kiln for pottery capable of eliminating unevenness of reduction gas to achieve favorable result of baking in a case of reduction baking in an electric kiln, and favorably eliminating deviation of inner temp...
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JP2004163095A |
To provide a serial-type kiln formed by connecting single kilns (units) to correspond to the amount of burned products and burning time, wherein the burning temperature of the burned products in the kiln are adjusted by a shielding plate...
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JP3494757B2 |
PURPOSE: To prevent the oxidization of copper, printed as a wiring, upon heating a print substrate made of ceramic. CONSTITUTION: A hot plate 4 is constituted of a plurality of divided bodies 4a, 4b, 4c and a plurality of passages 8 are ...
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JP2004037044A |
To provide a vacuum heating furnace for a FPD capable of heat treatment of a board as even as possible and having excellent productivity.A plurality of plate-like heaters 22 are provided between a plurality of boards 16, which are suppor...
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JP3475499B2 |
PURPOSE: To provide a belt type continuous heat treatment furnace, capable of miniaturizing the constitution of the whole of furnace and capable of applying sudden temperature change, necessitated practically, on a work to be treated. CO...
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JP3469746B2 |
To obtain an alumina porous carrier capable of being rapidly sintered and having uniform physical properties by introducing an alumina molded product comprising alumina powder and an inorganic binder into a roller hearth kiln and subsequ...
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JP2003535214A |
A nickel base alloy for high temperature thermal processing hardware requiring ultra-low spallation and metal loss rates in oxidizing and nitriding atmospheres for use in wire mesh belting, thermocouple sheathing, resistive heating eleme...
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JP2003289048A |
To provide a deformation preventing jig of a silica glass reactor core pipe for heat treatment capable of lengthening the life of the silica glass reactor core pipe even if being thin in thickness, and reducing heat treatment costs.This ...
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JP2003285312A |
To provide a drying method for a honeycomb molded object reducing the bending of the honeycomb molded object or the deformation of the cross-sectional shape of the honeycomb molded object.The honeycomb molded object has outer peripheral ...
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JP2003528985A |
According to a known method for producing a component by means of a powdery starting material, powder is mixed with auxiliaries comprising binding agents, whereby a free-flowing mass is produced. A green body is produced from the mass by...
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JP3451916B2 |
To provide a bright annealing furnace in which atmospheric gas surely penetrates into the inner surface of a material and decarburization can effectively be prevented and also, the uniform quality product can be obtd., by forming the sui...
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JP2003267548A |
To solve problems that a flaw or dirt are generated on glass substrate if the glass substrate moves a little and that organic gas re-adheres on the glass substrate due to insufficient discharge of organic gas generated during burning in ...
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JP3447898B2 |
To obtain a reaction chamber which is capable of distributing radiant heat and a reactive gas flow uniformly over the surface of a wafer and ensuring the wafer of an irreducibly minimal space by a method wherein a reaction chamber main b...
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JP2003227686A |
To provide a rotary heat treat furnace which simultaneously heat treats objects to be treated of different heat treatment conditions.The rotary heat treat furnace heat treats objects to be treated placed on a hearth as continuously rotat...
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JP2003194467A |
To provide a heat equalizing treatment device for a heat treated body with high heat equalizing accuracy and high cleanness.A heat treatment device for applying heat equalizing treatment to a heat treated body 12 has a heat treatment fur...
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JP2003073794A |
To provide a heat-resistant coated member which has satisfactory heat resistance, corrosion resistance, and non-reactiveness, and is effectively used for sintering or heat-treating metal or ceramic under vacuum, an inert atmosphere or a ...
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JP3378241B2 |
To provide a vertical heat treatment apparatus that can prevent a substrate retention tool from falling down not only during standby and loading and unloading into a reaction pipe, but also during treatment in the reaction pipe, and to p...
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JP2003045866A |
To provide a heat treating method and a small heat treatment system of a work in which increase in the number of samples is suppressed, hour by productivity is high in an analytic system, contamination on sample is suppressed and uniform...
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JP3373312B2 |
PURPOSE: To provide kiln furniture made of oxide-containing SiC, in which various characteristics such as anti-spalling, anti-oxidation and anti-creep are well balanced. CONSTITUTION: 0.01 to 0.7wt.% V2O5, 0.01 to 0.7wt.% CaO and 0.01 to...
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JP2003021468A |
To obtain a heat treatment furnace in which even a part of a planar article being supported by an article support can be heated or cooled similarly to other parts.A planar article 5 placed in a furnace is supported by an article receiver...
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JP3364223B2 |
PCT No. PCT/JP94/00129 Sec. 371 Date Sep. 12, 1994 Sec. 102(e) Date Sep. 12, 1994 PCT Filed Jan. 31, 1994 PCT Pub. No. WO94/17972 PCT Pub. Date Aug. 18, 1994.A firing underlying board having a long use life free from thermal expansion an...
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JP2003500329A |
(57) [Summary] The present invention relates to the manufacture of quartz glass type materials based on glass crushing used in exterior and interior finishes and floors of buildings and structures to produce aesthetically pleasing decora...
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