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WO/2014/196377A1 |
A sintered sputtering target containing a Fe-Pt alloy and a non-magnetic material as the main components, said sintered sputtering target being characterized in that at least C (carbon) is contained as the non-magnetic material, an addit...
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WO/2014/180928A1 |
The invention relates to a mechanical assembly having improved behavior with respect to fatigue combined with wear due to micro-movements, wherein said assembly comprises at least two parts that are attached to one another. At least one ...
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WO/2014/178310A1 |
A sintered body which contains at least cobalt as a metal and is composed of boron and/or at least one metal selected from platinum group elements or an alloy of the metal and an oxide, said sintered body being characterized in that at l...
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WO/2014/132746A1 |
Provided is an FePt-C-based sputtering target with which a thin film that contains an FePt-based alloy and is capable of being used as a magnetic recording medium can be formed independently without using a plurality of targets, the FePt...
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WO/2014/121384A1 |
Use of Ca in metal matrix composites (MMC) allows for incorporation of small and large amounts of ceramic (e.g. rutile Ti02) into the metal (Al, or its alloys). Calcium remains principally out of the matrix and is part of a boundary laye...
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WO/2014/114714A1 |
The present invention relates to a method for producing sintered spray powders containing chromium nitride, comprising the following steps: a) preparing a powder mixture (A) comprising i) a powder (B) containing one or more components se...
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WO/2014/108470A1 |
The invention concerns a method for preparing an AI/TiC nanocomposite material comprising an aluminium matrix in which particles comprising TiC are dispersed and having a nanometric size. It comprises: a) preparing a first mixture of pow...
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WO/2014/105215A1 |
A hard-faced article includes a wear-resistance element that has a precipitated hard phase and a non-precipitated hard phase that is different from the precipitated hard phase in composition. The precipitated hard phase and the non-preci...
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WO/2014/097911A1 |
A sintered sputtering target which comprises an alloy having a chemical composition containing 25 to 40 mol% of Cr and a remainder made up by Co and a non-metallic substance dispersed in the alloy, said sintered sputtering target being c...
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WO/2014/086655A1 |
A method for manufacturing of a wear resistant component comprising the steps: providing a form defining at least a portion of the shape of the component; providing a powder mixture comprising 30 – 70 vol% of a powder of tungsten carbi...
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WO/2014/073392A1 |
Provided is a powder for use in the formation of a sprayed layer, which contains a Mo2NiB2-type complex boride, said powder being characterized by having a chemical composition comprising 4.0 to 6.0 wt% of B, 35.5 to 53.25 wt% of Mo, 10....
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WO/2014/060047A1 |
The present invention discloses a dendrite reinforced metal in which a coarse dendrite structure is entangled with a fine, preferably nano-scaled, dendrite structure, and a method for making such material. The method for making the entan...
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WO/2014/061494A1 |
This boron-containing aluminum material is obtained by carrying out the following: a mixed powder, obtained by mixing a boride powder containing first boride particles, second boride particles and particles of unavoidable impurities with...
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WO/2014/044432A1 |
The invention relates to a method (S1-S13) used for the production of a refractory metal component, said method having the following steps: provision (S4) of an extrusion mass (M) which contains a refractory metal powder consisting of at...
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WO/2014/044431A1 |
The invention relates to a method used for the production of a refractory metal component (1), said method having the following steps: application of a powder coating (P1-Pn) comprising refractory metal powder; and selective irradiation ...
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WO/2014/043840A1 |
A metal matrix ceramic composite material and manufacturing method, applications thereof are disclosed. By extrusion casting technique to infiltrate matrix metal into the space between the ceramic particles, the metal matrix ceramic comp...
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WO/2014/041027A1 |
A method for manufacturing a wear resistant component, comprising the steps: providing a mould defining at least a portion of the component; providing a powder mixture comprising a first powder of tungsten carbide and a second powder of ...
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WO/2014/034877A1 |
Provided is a metal-based composite material which has a sufficient radiation absorption function, also has excellent strength, corrosion resistance, processability, impact resistance and heat conductivity, and is inexpensive. A metal-ba...
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WO/2013/190943A1 |
A carbon-containing sputtering target for a magnetic recording film, characterized in that the peak intensity ratio (IG/ID) of G band to D band in Raman spectroscopy is 5.0 or more. The present invention addresses the problem of providin...
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WO/2013/161523A1 |
Provided is a cermet covering material obtained by covering a substrate with a cermet layer, wherein the cermet covering material is characterized in that the cermet layer contains 30 to 80 percent by mass of a hard phase including a com...
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WO/2013/140699A1 |
Disclosed are: an electric contact (14), which has improved durability by preventing a terminal (2a) of an electric component and the electric contact (14) from sticking to each other after continuity test; and a socket (10) for electron...
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WO/2013/141273A1 |
An electrode material which constitutes a movable electrode (50) in a thermal cutout (1) and which has a clad structure formed by joining a base layer consisting of Cu or a Cu alloy to a contact layer consisting of an Ag-CuO based oxide-...
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WO/2013/137030A1 |
The purpose of the present invention is to provide, in friction-stirring joining of oxide-dispersion-strengthened platinum, a friction-stirring processing method that, through control of the organization of the welding site, can further ...
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WO/2013/136962A1 |
This oxide-containing magnetic material sputtering target is characterized in that the average grain diameter of said oxides is 400nm or less. This method of manufacturing an oxide-containing magnetic material sputtering target involves ...
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WO/2013/108520A1 |
A sputtering target which contains, as metal components, 0.5-45 mol% of Cr and the balance of Co, while containing, as non-metal components, two or more oxides including Ti oxide. This sputtering target is characterized in that: the stru...
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WO/2013/105648A1 |
Provided are an FePt sputtering target with which it is possible to eliminate the use of multiple targets and use only a thin film comprising an FePt alloy that is suitable as a magnetic recording medium, and a method for producing the s...
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WO/2013/105647A1 |
Provided are an FePt sputtering target with which it is possible to eliminate the use of multiple targets and use only a thin film comprising an FePt alloy that is suitable as a magnetic recording medium, and a method for producing the s...
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WO/2013/094605A1 |
A sputtering target for magnetic recording films, which is characterized by containing from 5 mol% to 60 mol% (inclusive) of Pt, from 0.1 mol% to 40 mol% (inclusive) of C and from 0.05 mol% to 20 mol% (inclusive) of titanium oxide, with ...
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WO/2013/089176A1 |
Provided is a heat-resistant alloy having properties such as proof strength and hardness that allow substances with higher melting points than before to be joined. This heat-resistant alloy has a first phase containing a molybdenum or tu...
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WO/2013/089177A1 |
Provided is a heat-resistant alloy having properties such as proof strength and hardness that allow substances with higher melting points than before to be joined. This heat-resistant alloy consists primarily of a first phase containing ...
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WO/2013/074038A1 |
An electrical contact (1) comprising a substrate (2) at least on one side provided with a noble metal contact layer (3). The contact layer (3) comprises a solid lubricant zone (4) close to an upper surface of the contact layer, with soli...
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WO/2013/056794A1 |
The invention relates to a method for producing a composite material comprising a metal component and a ceramic component. A first metal, a second metal which is noble relative to the first metal, and at least one oxidation-reactive elem...
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WO/2013/054752A1 |
Provided is a member having a sliding part obtained by covering the surface of a metal base material with a cermet layer having a hard phase containing an Mo2FeB2-type or an Mo2NiB2-type complex boride, the member characterized in that t...
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WO/2013/041729A1 |
The invention relates to a method for producing components using a powder that has been melt-atomised in an inert gas atmosphere from an aluminium or Al alloy with integrated hard materials, in particular from MMCs (metal matrix composit...
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WO/2013/041305A1 |
The invention relates to a method for producing components using an overspray with integrated hard materials, in particular from MMCs (metal matrix composites), wherein MMC particles are subsequently added to the molten and atomised meta...
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WO/2013/037502A1 |
Method for producing, in particular, a graded metal matrix composite material, wherein a first metal, a more precious second metal and at least one oxidation-reactive element are melted in a molten mass, wherein the molten mass is cooled...
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WO/2013/031765A1 |
Powder for a clay-like composition for forming a sintered silver-copper alloy object, the powder being a powder component containing silver-containing powder and powder of a copper compound, wherein the powder of a copper compound contai...
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WO/2013/030123A1 |
The present invention relates to a novel method for producing metallic semifinished products by extrusion, to the semifinished products thus obtained and to contact pieces that can be produced therefrom.
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WO/2013/018823A1 |
[Problem] To realize a metal-base composite material of which the thermal expansion can be controlled with high precision. [Solution] In one embodiment of the present invention, a metal composite material with controlled thermal expansio...
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WO/2013/015158A1 |
Disclosed is a heat dissipating component for a semiconductor element, having a tabular body 0.4-6 mm in thickness containing 40-70 volume% of diamond particles, with the balance comprising metal of which the principal component is alumi...
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WO/2013/003506A1 |
A thick film paste comprising at least one particulate platinum (alloy), at least one metal compound, and an organic vehicle, wherein the at least one metal compound is selected from the group consisting of in each case particulate NiO, ...
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WO/2013/003508A1 |
A thick film pastes comprising at least one particulate platinum (alloy)/metal oxide composite, an organic vehicle and, as an optional component, at least one particulate platinum (alloy), wherein the total proportion of particulate plat...
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WO/2012/168530A1 |
The invention relates to a compound material for the manufacture of ecological ammunition, characterized in that it includes a) a metal matrix consisting of an alloy of zinc and bismuth, of zinc and aluminum, of tin and bismuth or of zin...
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WO/2012/133328A1 |
Provided is a hard sintered alloy formed from hard phase particles that contain a M2M'B2 type compound boride (M and M' being different metal atoms) and a binder phase that contains an alloy containing M' as a main component. The hard si...
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WO/2012/133513A1 |
The present invention provides a sintered friction material having a high braking force, with the braking force having excellent high-temperature stability. This sintered friction material comprises a chemical composition that contains, ...
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WO/2012/119647A1 |
Composite material combining: - a precious metal or an alloy containing a precious metal, - and a boron-based ceramic having a melting point above that of said precious metal and a density at most equal to 4 g/cm3.
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WO/2012/113428A1 |
The invention relates to an aluminum matrix composite material which is suitable for producing at least a friction ring of a brake disk. The aluminum matrix composite material comprises 20 to 40% by weight of aluminum, 10 to 30% by weigh...
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WO/2012/086388A1 |
Disclosed is a sintered body sputtering target containing Co and Cr as a metal component and comprising oxides dispersed in the substrate of said metal component. The structure of said sputtering target has, in the metal substrate, a reg...
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WO/2012/086578A1 |
A ferromagnetic sputtering target the composition of which is 5 to 50 mol% of Pt, 5 to 15 mol% of SiO2, 0.05 to 0.60 mol% of Sn, and Fe as the balance, wherein the above-mentioned Sn is contained in SiO2 particles (B) dispersed in a meta...
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WO/2012/086300A1 |
A SiO2-containing sputtering target for a magnetic recording film, which is characterized in that the ratio of the peak intensity of face (011) of quarts relative to the background intensity (i.e., quartz peak intensity/background intens...
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