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JP2024009780A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP7414500B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition containing the s...
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JP2024001869A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator, and a resist composit...
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JP2023184475A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by a specific formula, a carboxylic acid generator, and a re...
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JP2023184474A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate of a triphenylsulfonium cation of a specific structure having a cyc...
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JP2023184476A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having a good mask error factor to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP7405377B2 |
The present invention relates to a compound of the following formula (I):The invention also relates to uses thereof as dye or pigment, notably as a luster pigment. The invention relates also to a reflective or photonic or nanophotonic or...
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JP2023177302A |
To provide a salt, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177294A |
To provide a salt, a resist composition and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177295A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2023177296A |
To provide a salt, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2023177303A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist comp...
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JP2023177297A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.There are provided: a carboxylate represented by formula (I) and the like; and a resist composition. ...
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JP2023171323A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.There are provided: a salt of a sulfonium cation of a specific structure and a sulfonate anion of a specific stru...
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JP7389562B2 |
Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):In formula (I), R1, R2, R3, R4 and R5 each independently represent a ...
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JP2023169812A |
To provide a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing ...
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JP2023168301A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.There are provided a carboxylate represented by formula (I), a carboxylic a...
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JP2023168293A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, R3, R4, and R5 each...
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JP2023166272A |
To provide a copolymer and a method for producing the same, and a cyclic carbonate compound.A copolymer includes a repeat unit represented by the following formula (II) and another repeat unit including an oxygen atom. (R1 and R2 each re...
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JP2023160797A |
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; an...
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JP2023160800A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023160801A |
To provide a carboxylate and the like which allow a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; and a re...
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JP2023160799A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; an...
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JP2023160798A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023160796A |
To provide a salt which allows a resist pattern having a good focus margin to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a res...
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JP7372756B2 |
A salt represented by formula (I):In formula (I), R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R5, R6 and R7 each independently represent a halogen atom, a hydroxy gr...
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JP2023156257A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023156261A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023156259A |
To provide a salt and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula, ...
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JP2023156258A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023156260A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid ge...
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JP2023156256A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition containi...
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JP2023153089A |
To provide a resist composition that produces a resist pattern with excellent CD uniformity.A resist composition contains an acid generator containing a salt represented by formula (I), and an acid-stable resin containing one or more str...
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JP2023145501A |
To provide an acid generator and a resist composition which contain a salt allowing a resist pattern to be produced with good line edge roughness (LER).There are provided: a salt represented by formula (I) and the like; and a resist comp...
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JP7340608B2 |
A compound has an excellent rate of change in HTP caused by exposure. A liquid crystal composition is formed of the compound. A cured product, an optically anisotropic body, and a reflective film can be obtained by curing the liquid crys...
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JP2023121152A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP2023109732A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023109731A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023109734A |
To provide a carboxylate which allows a resist pattern having a good focus margin to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a ca...
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JP2023109729A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023109733A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023109728A |
To provide a salt which allows a resist pattern having a good mask error factor to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023101395A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin...
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JP2023081849A |
To provide salt, an acid generator, and a resist composition including the same, with which it is possible to manufacture a resist pattern having good CD uniformity (CDU).Salt has a specific structure that triphenylsulfonium cation has, ...
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JP7269317B2 |
A compound having an excellent rate of change in HTP caused by exposure is achieved and is represented by General Formula (1). In addition, a composition is formed of the compound, and a cured product, an optically anisotropic body, or a...
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JP2023058024A |
To provide a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.The resist composition contains a compound represented by formula (I), a resin containing a structural unit having an acid-labile...
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JP2023058023A |
To provide a resist composition from which a resist pattern having good line edge roughness can be produced.The resist composition contains a compound represented by formula (I), a resin having an acid-labile group, and an acid generator...
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JP2023514581A |
The present invention relates to the use of lignin derivatives to reduce and/or prevent deposits on objects during machine dishwashing processes. Further, the present invention relates to methods for reducing and/or preventing deposits o...
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JP2023035962A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.The present invention provides a carboxylate represent...
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JP2023035959A |
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU) and a resist composition comprising the same.The present invention provides a salt represented by formula (I), an acid generator and a resist compos...
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